发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a resin composition that reduces outgassing during a lamination process or after curing, provides a cured film having excellent weather resistance and light resistance and also excellent flexibility, and has a low shrinkage rate at the time of curing.SOLUTION: A photosensitive resin composition (D) comprises a self-polymerization type photopolymerizable compound (A) represented by general formula (1), a urethane (meth) acrylate compound (B), and a polymerizable compound (C) other than (B) as essential components (in the formula, R is a hydrogen atom or a methyl group).SELECTED DRAWING: None
申请公布号 JP2016138165(A) 申请公布日期 2016.08.04
申请号 JP20150012349 申请日期 2015.01.26
申请人 NIPPON KAYAKU CO LTD 发明人 KAMETANI HIDETERU;IIZUKA MASAYUKI;MOTOHASHI HAYATO;MIZUGUCHI TAKAFUMI
分类号 C08F2/50;C08F220/36;C08F290/06 主分类号 C08F2/50
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