发明名称 |
PRODUCTION METHOD OF SUBSTRATE HAVING TRANSPARENT CONDUCTIVE FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a substrate having a transparent conductive film, with which unremoved residue produced in removal of the transparent conductive film with laser is prevented from adhering to an electrode part or the like.SOLUTION: A production method of a substrate 10 having a transparent conductive film, which includes a substrate 1 having a first main surface 1a and a second main surface 1b and a transparent conductive film 2 arranged on the first main surface 1a, and in which the transparent conductive film 2 is patterned with irradiation of laser 20, includes: a step to prepare the substrate 10 having the transparent conductive film in which the transparent conductive film 2 before patterning is arranged; a step to bring a liquid 30 which is transparent to the laser 20 into contact with the transparent conductive film 2; and a step to focus the laser 20 on the transparent conductive film 2 in contact with the liquid 30, and to remove a part of the transparent conductive film 2 so as to conduct patterning.SELECTED DRAWING: Figure 2 |
申请公布号 |
JP2016213056(A) |
申请公布日期 |
2016.12.15 |
申请号 |
JP20150095808 |
申请日期 |
2015.05.08 |
申请人 |
NIPPON ELECTRIC GLASS CO LTD |
发明人 |
WADA MASANORI;KASHIWATANI TAKESHI;HIRAO TORU |
分类号 |
H01B13/00;B23K26/122;B23K26/16;B23K26/351;B23K26/57;B32B7/02;B32B9/00;C03C17/23;H01B5/14;H01L51/50;H05B33/02;H05B33/28 |
主分类号 |
H01B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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