| 摘要 |
PROBLEM TO BE SOLVED: To improve accuracy in substrate inspection.SOLUTION: A substrate inspection device comprises: a probe unit 2 composed to have respective tip units of a plurality of probes respectively coming into contact with a plurality of contact subject areas in a substrate 100; a movement mechanism 3 for executing movement processing for moving the probe unit 2 toward the substrate 100; an inspection unit 6 for inspecting the substrate; and a processing unit 8 for specifying the variation in clearances between respective tip units and respective contact subject areas. In this case, respective probes are arranged to have respective tip units coming into contact with respective contact subject areas for respective sets having a pair of probes which are mutually adjacent to be a set. The inspection unit 6 discriminate whether or not respective tip units of a pair of probes in respective sets and the contact subject areas are in contact while the movement processing is executed, the processing unit 8 specifies the variation between the clearances for every set based on the movement amount of the probe unit 2 up to when respective tip units and contact subject areas of a pair of probes are discriminated to be in contact with the contact subject area by the inspection unit 6. |
