发明名称 |
CAPACITOR |
摘要 |
The present invention provides a highly reliable capacitor which is unlikely to be affected by impurities on the surface of a porous metal base material, and small in leakage current. The capacitor according to the present invention includes a porous metal base material, a first buffer layer formed by an atomic layer deposition method on the porous metal base material, a dielectric layer formed by an atomic layer deposition method on the first buffer layer, and an upper electrode formed on the dielectric layer. |
申请公布号 |
EP3104381(A1) |
申请公布日期 |
2016.12.14 |
申请号 |
EP20150745875 |
申请日期 |
2015.01.09 |
申请人 |
Murata Manufacturing Co., Ltd. |
发明人 |
SAEKI, Hiromasa;INOUE, Noriyuki;ARAKAWA, Takeo;IWAJI, Naoki |
分类号 |
H01G9/052;H01G4/08;H01G4/10;H01G9/00 |
主分类号 |
H01G9/052 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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