发明名称 半導電性グラフェン構造、このような構造の形成方法およびこのような構造を含む半導体デバイス
摘要 A semiconducting graphene structure may include a graphene material and a graphene-lattice matching material over at least a portion of the graphene material, wherein the graphene-lattice matching material has a lattice constant within about ±5% of a multiple of the lattice constant or bond length of the graphene material. The semiconducting graphene structure may have an energy band gap of at least about 0.5 eV. A method of modifying an energy band gap of a graphene material may include forming a graphene-lattice matching material over at least a portion of a graphene material, the graphene-lattice matching material having a lattice constant within about ±5% of a multiple of the lattice constant or bond length of the graphene material.
申请公布号 JP6043022(B2) 申请公布日期 2016.12.14
申请号 JP20160518148 申请日期 2014.07.15
申请人 マイクロン テクノロジー, インク. 发明人 ミード,ロイ イー.;パンディ,スミート シー.
分类号 H01L29/786;C01B31/02;H01L51/05;H01L51/30 主分类号 H01L29/786
代理机构 代理人
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