发明名称 エッチングマスク用組成物およびパターン形成方法
摘要 The invention provides a composition for etching a mask of a substrate for a solar cell which improves printing performance when the composition is printed on the substrate of the solar cell. The composition for etching the mask of the substrate for the solar cell according to one solution is non-photosensitive and comprises the components of: 100 by mass parts of bakelite (A), 20-100 by mass parts of SiO2 particles (B) and a solvent (C).
申请公布号 JP6045920(B2) 申请公布日期 2016.12.14
申请号 JP20130006544 申请日期 2013.01.17
申请人 東京応化工業株式会社 发明人 吉井 靖博
分类号 C09D11/033;H01L21/306;H01L31/04 主分类号 C09D11/033
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