发明名称 トンネルトランジスタ
摘要 In one embodiment, a semiconductor device includes a first diffusion layer of a first conductive type and a second diffusion layer of a second conductive type which is a reverse conductive type of the first conductive type, the first conductive type first diffusion layer and the second conductive type diffusion layer being spaced apart and provided in a semiconductor layer, a pocket region of the second conductive type which is provided on a surface portion of the semiconductor layer adjacently to the first diffusion layer, and a first extension region of the first conductive type which is provided in the semiconductor layer to cover at least a portion of the pocket region. A second diffusion layer side end portion of the first extension region is positioned closer to a second diffusion layer side than a second diffusion layer side end portion of the pocket region.
申请公布号 JP6043193(B2) 申请公布日期 2016.12.14
申请号 JP20130013150 申请日期 2013.01.28
申请人 株式会社東芝 发明人 近 藤 佳 之;外 園 明
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
代理机构 代理人
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