| 摘要 |
In a solid-state imaging apparatus in which a first substrate formed on a first semiconductor wafer and a second substrate formed on a second semiconductor wafer are bonded via a connection portion configured to electrically connect the first and second substrates, the first substrate includes a first pixel region in which a plurality of first photoelectric conversion elements partially transmit incident light and are arranged in a two-dimensional shape. The second substrate includes a second pixel region in which a plurality of second photoelectric conversion elements are arranged in a two-dimensional shape in at least a partial region of a region corresponding to the first pixel region. The first photoelectric conversion elements generate imaging signals, and the second photoelectric conversion elements generate signals to be used in imaging preparation. |
