| 摘要 |
An object of the present invention is to increase the load-end voltage and to select an ignition voltage high enough for the load-end voltage of a plasma load to generate a plasma discharge. When RF power is supplied from an RF generator to a load via a power supply unit,
(a) the internal impedance of the RF generator is made lower than the characteristic impedance of the power supply unit, and
(b) the load-end voltage is increased by selecting the electrical length L E of the power supply unit, which connects between the RF generator and the load to supply RF power, so that the electrical length L E has a predetermined relation with the fundamental wavelength » of the RF AC. More specifically, the electrical length L E of the power supply unit is selected in such a way that, when the load end, which is the input end of the load, is in an open state, the electrical length L E is (2n-1)·(»/4)-k·»‰¤L E ‰¤(2n-1)·(»/4)+k·» (n is an integer, k is {À-2·cos -1 (1/K)}/(4À)) with respect to the fundamental wavelength » of the RF AC. |
