INSPECTION METHOD AND TEMPLATE

摘要

PROBLEM TO BE SOLVED: To provide an inspection method and a template with which it is possible to appropriately adjust a focus offset and detect with high accuracy a pattern defect finer than the resolution limit of the optical system of an inspection device.SOLUTION: The transfer surface Sf1 of the template is provided with: a first pattern P1-1 consisting of a repeating pattern that cannot be resolved by the wavelength of a light source; a second pattern P1-2 disposed on the same plane as the first pattern P1-1 and facing in the same direction as the first pattern P1-1, and consisting of a repeating pattern that cannot be resolved by the wavelength of a light source; a dummy defect D1 provided in the second pattern P1-2 and not resolvable by the wavelength of a light source; and a third pattern P1-3 disposed on the same plane as the first pattern P1-1 and shaped to reflect the direction of the first pattern P1-1. The optical image of the dummy defect D1 is captured while changing the focal distance between the transfer surface Sf1 and the optical system, whereby a focus offset is adjusted.SELECTED DRAWING: Figure 2