发明名称 CHARGE DRAIN COATING FOR ELECTRON-OPTICAL MEMS
摘要 A system and method associated with a charge drain coating are disclosed. The charge drain coating may be applied to surfaces of an electron-optical device to drain electrons that come into contact with the charge drain coating so that the performance of the electron-optical device will not be hindered by electron charge build-up. The charge drain coating may include a doping material that coalesces into clusters that are embedded within a high dielectric insulating material. The charge drain coating may be deposited onto the inner surfaces of lenslets of the electron-optical device.
申请公布号 US2016358742(A1) 申请公布日期 2016.12.08
申请号 US201314052610 申请日期 2013.10.11
申请人 Tong William M.;Brodie Alan D.;Elam Jeffrey;Mane Anil 发明人 Tong William M.;Brodie Alan D.;Elam Jeffrey;Mane Anil
分类号 H01J37/06;H01J37/12;C23C16/32;C23C16/40;C23C16/34;H01J37/317;C23C16/455 主分类号 H01J37/06
代理机构 代理人
主权项 1. A micro-electromechanical systems (MEMS) device to receive an electron beam in an electron-beam lithography chamber, the MEMS device comprising: a plurality of lenslets to receive electrons from the electron beam, each of the lenslets are configured to either transmit or not to transmit, or to reflect or not to reflect, at least some of the electrons from the electron beam; and a charge drain coating on at least some of the inner surfaces of each of the lenslets to drain any of the electrons that have become embedded into the charge drain coating, the charge drain coating includes insulating material and at least one doping material embedded within the insulating material, the doping material includes at least one nanocluster.
地址 San Francisco CA US