| 摘要 |
A method of forming a NAND Flash memory device includes forming a control gate polysilicon layer over a substrate, forming a mask layer over the control gate polysilicon layer, the mask layer including a mask pattern defining a plurality of spaced word lines of the FLASH memory device, the word lines being spaced from each other a distance less than a minimum feature size which can be imaged by a selected photolithography process used in forming at least a portion of the mask layer pattern, and etching the control gate polysilicon layer through the mask layer.
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