| 发明名称 |
UNDERLAYER FILM COMPOSITION AND METHOD FOR FORMING MULTILAYER RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an underlayer film composition for forming an underlayer film having a low reflectance for exposure light at a short wavelength and excellent etching resistance against oxygen plasma or the like, and to provide a method for forming a multilayer resist pattern. <P>SOLUTION: The underlayer film composition to be used for an underlayer film of a photoresist layer comprises a copolymer having a structural unit derived from an acryl monomer having adamantyl group which may have a substituent in a side chain and a structural unit derived from a hydroxystyrene derivative. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2007240630(A) |
申请公布日期 |
2007.09.20 |
| 申请号 |
JP20060059743 |
申请日期 |
2006.03.06 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
TAKAGI ISAMU;SATO KAZUFUMI;TANAKA TAKESHI |
| 分类号 |
G03F7/11;G03F7/40;H01L21/027 |
主分类号 |
G03F7/11 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
