Systems, Methods and Apparatus for Choked Flow Element Extraction

摘要

A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.

主权项

1. A plasma system, comprising:
a plurality of ring plasma chambers including an inner ring plasma chamber and one or more outer ring plasma chambers, each of the plurality of ring plasma chamber having a plurality of gas inlet ports for receiving a process gas; a plurality of primary windings disposed around a circumference of each of the ring plasma chambers; a plurality of ferrites arranged around each one of the plurality of ring plasma chambers, wherein each turn of each of the plurality of primary windings pass through an inside portion of each of the respective plurality of ferrites; and a chamber top for supporting the plurality of ring plasma chambers, the chamber top further including a plurality of plasma chamber outlets coupling the plurality of ring plasma chambers to a process chamber disposed below the chamber top, wherein each of the plurality of gas inlet ports of each of the plurality of ring plasma chambers align with respective ones of the plurality of plasma chamber outlets.