MEASUREMENT APPARATUS, SYSTEM, AND METHOD OF MANUFACTURING ARTICLE

摘要

The present invention provides a measurement apparatus for measuring a shape of an object using pattern light, comprising a light source having a structure including a reflecting portion for reflecting light, a mask including a pattern region which includes reflecting regions for reflecting light, and configured to generate the pattern light, an optical system arranged between the light source and the mask, wherein the light source, the optical system, and the mask are arranged so that light emitted from the light source is incident on the reflecting region via the optical system, is reflected by the reflecting region to return to the light source via the optical system, and then is reflected by the reflecting portion of the light source to enter the transmitting region via the optical system.

主权项

1. A measurement apparatus for measuring a shape of an object using pattern light, comprising:
a light source having a structure including a light emitting portion for emitting light and a reflecting portion for reflecting light; a mask including a pattern region in which transmitting regions for transmitting light and reflecting regions for reflecting light are periodically arranged, and configured to generate the pattern light; an optical system arranged between the light source and the mask; an imaging unit configured to image the object irradiated with the pattern light; and a processor configured to obtain the shape of the object based on an image obtained by the imaging unit, wherein the light source, the optical system, and the mask are arranged so that light emitted from the light source is incident on the reflecting region of the mask via the optical system, is reflected by the reflecting region to return to the light source via the optical system, and then is reflected by the reflecting portion of the light source to enter the transmitting region of the mask via the optical system.