| 摘要 |
Provided is a photocurable composition for nano-implants, which can be irradiated with light to yield cured products with excellent heat resistance and etching resistance. This photocurable composition for nano-implants contains a cation-curable compound, said cation-curable compound containing a compound represented by formula (a), the weight-average value for the Ohnishi parameter of the cation-curable compound does not exceed 3.2, the weight average value for the ring parameter is at least 0.4, and the rate of reduction in weight calculated by simultaneous thermogravimetric/differential thermal analysis when the cured photocurable composition for nano-implants is maintained at a temperature of 250°C for 30 minutes does not exceed 10%. |
