| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition improved in the shape of a pattern profile, sensitivity, resolution, line edge roughness and dissolution contrast, and also to provide a pattern forming method using the same. <P>SOLUTION: The positive resist composition contains: (A) a resin which comprises a repeating unit having a specified group and a repeating unit having a specified group and is decomposed by the action of an acid to increase solubility in an alkaline developer; and (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation. The pattern forming method uses the same. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
