| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To easily detect both of a phase shift pattern defect and a normal mask pattern defect in a phase shift mask by an easy operation. <P>SOLUTION: The mask inspection apparatus 100 to inspect phase defects in an exposure mask 150 is equipped with a light source 110, an illumination optical system 120 to homogenize the light L emitting from the light source 110, and an objective optical system 130 to condense the light L exiting from the illumination optical system 120 and transmitting through an exposure mask 150 for imaging onto an observation plane 140. The mask inspection apparatus 100 is also equipped with: a phase difference filter 167 disposed on the pupil plane PL of the objective optical system in the region where the 0-order diffraction light transmitting through the exposure mask 150 passes; and an annular aperture diaphragm 163 on the pupil plane iPL of the illumination optical system, the aperture diaphragm having a conjugate feature to the phase difference filter 167. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
