Verfahren zur Beschichtung einer Substratoberfläche unter Verwendung eines Plasmastrahles.,申请号CH20030001639-传众专利搜索

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发明名称	Verfahren zur Beschichtung einer Substratoberfläche unter Verwendung eines Plasmastrahles.
摘要
申请公布号	CH696811(A5)	申请公布日期	2007.12.14
申请号	CH20030001639	申请日期	2003.09.26
申请人	DR.-ING. DIPL.PHYS. MICHAEL DVORAK	发明人	DVORAK MICAHEL DR.-ING.
分类号	C23C4/12;C23C4/06	主分类号	C23C4/12
代理机构		代理人
主权项
地址

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