| 摘要 |
The present invention provides an imprint apparatus which performs an imprint process in which a resin on a substrate is cured, in a contact state in which a mold is kept in contact with the resin, to transfer a pattern onto the substrate, the apparatus including a stage configured to move upon holding the substrate, a detection unit configured to detect a first mark formed on the mold, and a second mark formed on the substrate, and a processing unit configured to perform alignment of the mold and the substrate in the contact state. |
