| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint apparatus capable of improving alignment accuracy between a substrate and a mold by avoiding positional interference between an illumination system and a detection system and increasing the number of detection apertures of the detection system for simultaneously detecting marks formed on the substrate and the mold.SOLUTION: The imprint apparatus for forming a pattern by using a mold onto an imprint material on a substrate includes: a light receiving element; a relay optical system; and a detection optical system for introducing light from a mark formed on the substrate and a mark formed on the mold into the light receiving element through the relay optical system. An image plane of a surface of the substrate by the relay optical system is located between the relay optical system and the detection system. Means for changing a position of the detection optical system with respect to the image plane is provided. The light from the mark formed on the substrate and the mark formed on the mold is detected by the light receiving element, and positions of the substrate and the mold are aligned on the basis of the detection result. |
