摘要 |
It is an object of the present invention to provide a supporting structure of optical elements, in which lens surface deformation due to the strain produced during assembling can be reduced and stable and high resolution with small aberration can be obtained, and an optical apparatus such as an exposure apparatus constructed by using the supporting structure, and a method for manufacturing a semiconductor device constructed from the optical apparatus, etc. In the exposure apparatus, a supporting structure comprises a first supporting member for supporting the optical element, a second supporting member arranged in the outer diameter side of the first supporting member for supporting the first supporting member, and an elastic member placed between the first supporting member and the second supporting member in the radial direction, the inner diameter side of the elastic member being connected to the first supporting member while the outer diameter side of the elastic member being connected to the second supporting member, the elastic member being elastically deformable in the radial direction, wherein the first supporting member does not contact the second supporting member in the axial direction.
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