发明名称 PHOTOSENSITIVE RESIN AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To easily obtain a photosensitive resin having wide aptitude and superior preservation stability and high sensitivity and high resolution. SOLUTION: This photosensitive resin is a photopolymerizable type resin, having a polyvinyl acetate saponified product as a main structural chain comprising the structural units each represented by general formula I. The photosensitive resin composition is prepared by using this photosensitive resin.
申请公布号 JP2000181062(A) 申请公布日期 2000.06.30
申请号 JP19980362301 申请日期 1998.12.21
申请人 TOYO GOSEI KOGYO KK 发明人 UTSUNOMIYA SHIN;TAKANO KAZUHIRO;SAKAI NOBUSHI;TOCHISAWA TETSUAKI
分类号 G03F7/027;C08F18/08;G03F7/033 主分类号 G03F7/027
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