发明名称 |
PHOTOSENSITIVE RESIN AND PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To easily obtain a photosensitive resin having wide aptitude and superior preservation stability and high sensitivity and high resolution. SOLUTION: This photosensitive resin is a photopolymerizable type resin, having a polyvinyl acetate saponified product as a main structural chain comprising the structural units each represented by general formula I. The photosensitive resin composition is prepared by using this photosensitive resin. |
申请公布号 |
JP2000181062(A) |
申请公布日期 |
2000.06.30 |
申请号 |
JP19980362301 |
申请日期 |
1998.12.21 |
申请人 |
TOYO GOSEI KOGYO KK |
发明人 |
UTSUNOMIYA SHIN;TAKANO KAZUHIRO;SAKAI NOBUSHI;TOCHISAWA TETSUAKI |
分类号 |
G03F7/027;C08F18/08;G03F7/033 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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