POSITIVE TYPE PHOTORESIST COATING SOLUTION FOR PRODUCTION OF LIQUID CRYSTAL ELEMENT AND SUBSTRATE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To obtain a positive type photoresist coating solution for a liquid crystal element which controls striation, unevenness in drying and traces of dropping in a well-balanced state. SOLUTION: (a) An alkali-soluble resin, (b) a quinonediazido group-containing compound and (c) a nonionic fluorine-and silicon-base surfactant having 10-25 wt.% fluorine content and 3-10 wt.% silicon content are dissolved in (d) an organic solvent to obtain the objective positive type photoresist coating solution for the production of a liquid crystal element. A substrate is coated with the coating solution.