发明名称 PHOTOSENSITIVE RESIN COMPOSITION CONTAINING COPOLYMER
摘要 There is provided a photosensitive resin composition having desired properties. A photosensitive resin composition comprising: a component (A) that is a copolymer including a structural unit of Formula (1) and at least one structural unit of Formula (2), and a component (B) that is a photosensitizer: (where two Xs are independently a hydrogen atom, a C 1-5 alkyl group, a C 5-6 cycloalkyl group, a phenyl group, or a benzyl group and Y is a hydrogen atom, a C 1-5 alkyl group, a C 5-6 cycloalkyl group, a phenyl group, or a benzyl group provided that each of a part or all of the hydrogen atoms in the alkyl group, the cycloalkyl group, the phenyl group, and the benzyl group is optionally substituted with a halogen atom, a carboxy group, a hydroxy group, an amino group, or a nitro group).
申请公布号 EP2479612(B1) 申请公布日期 2016.12.07
申请号 EP20100815285 申请日期 2010.08.30
申请人 Nissan Chemical Industries, Ltd. 发明人 KISHIOKA, Takahiro
分类号 G03F7/023;C08F226/06;G02B1/04 主分类号 G03F7/023
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