| 摘要 |
A method of manufacturing a thin film magnetic head on a substrate (22, 23) comprising the steps of depositing a magnetic bottom pole layer (26) on the substrate, depositing a gap material layer (28) on the magnetic bottom pole layer, depositing a magnetic upper pole layer (24) on the gap material layer and depositing a selectively etchable platable metal sacrificial mask layer (30) on the magnetic upper pole layer (24). <IMAGE> |
