发明名称 電子部品用積層配線膜および被覆層形成用スパッタリングターゲット材
摘要 PURPOSE: A laminated wiring layer for an electronic component and a sputtering target material for forming a coating layer are provided to improve waterproof properties and oxidation resistance by adding Ni and Ti to Mo with a preset ratio. CONSTITUTION: A main conductive layer(3) made of Cu as a main element is formed on a substrate(1). A coating layer(2,4) covers one side and/or the other side of the main conductive layer. The coating layer is formed by using a Mo alloy sputtering target. A composition expression of the coating layer satisfies Mo100-x-y-Nix-Tiy, 10<=x<=50, 3<=y<=30, and x+y<=53, wherein 20<=x<=30, 9<=y<=20. [Reference numerals] (1) Substrate; (2,4) Coating layer; (3) Main conductive layer
申请公布号 JP6037208(B2) 申请公布日期 2016.12.07
申请号 JP20120168042 申请日期 2012.07.30
申请人 日立金属株式会社 发明人 村田 英夫
分类号 C23C14/14;C22C27/04;C22C30/00;C23C14/34;H01L21/28;H01L21/285;H01L21/3205;H01L21/768;H01L23/532 主分类号 C23C14/14
代理机构 代理人
主权项
地址