发明名称 |
Polarizer and method of fabricating the same |
摘要 |
A method of fabricating a polarizer, the method including, forming a base substrate by sequentially forming a metal layer, a guide layer, a hard mask layer, a sacrificial layer, and a first photoresist layer on a light-transmitting substrate in a panel area and an alignment key area which are spatially separated from each other, forming a first photoresist layer pattern for forming an alignment key pattern in the alignment key area by patterning the first photoresist layer, forming a sacrificial layer pattern in the alignment key area utilizing the first photoresist layer pattern as a mask, and forming a second photoresist layer on a top surface of the sacrificial layer pattern of the alignment key area before removing the sacrificial layer of an aperture area of the panel area. |
申请公布号 |
US9594200(B2) |
申请公布日期 |
2017.03.14 |
申请号 |
US201514667588 |
申请日期 |
2015.03.24 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Park Seung Won;Kim Tae Woo;Yoon Dae Ho;Lee Moon Gyu |
分类号 |
G02B5/30;G03F7/00 |
主分类号 |
G02B5/30 |
代理机构 |
Lewis Roca Rothgerber Christie LLP |
代理人 |
Lewis Roca Rothgerber Christie LLP |
主权项 |
1. A method of fabricating a polarizer, the method comprising:
forming a base substrate by sequentially forming a metal layer, a guide layer, a hard mask layer, a sacrificial layer, and a first photoresist layer on a light-transmitting substrate in a panel area and an alignment key area spatially separated from the panel area; forming a first photoresist layer pattern for forming an alignment key pattern in the alignment key area by patterning the first photoresist layer; forming a sacrificial layer pattern in the alignment key area utilizing the first photoresist layer pattern as a first mask; and forming a second photoresist layer on a top surface of the sacrificial layer pattern of the alignment key area before removing the sacrificial layer of an aperture area of the panel area. |
地址 |
Yongin-si KR |