发明名称 Polarizer and method of fabricating the same
摘要 A method of fabricating a polarizer, the method including, forming a base substrate by sequentially forming a metal layer, a guide layer, a hard mask layer, a sacrificial layer, and a first photoresist layer on a light-transmitting substrate in a panel area and an alignment key area which are spatially separated from each other, forming a first photoresist layer pattern for forming an alignment key pattern in the alignment key area by patterning the first photoresist layer, forming a sacrificial layer pattern in the alignment key area utilizing the first photoresist layer pattern as a mask, and forming a second photoresist layer on a top surface of the sacrificial layer pattern of the alignment key area before removing the sacrificial layer of an aperture area of the panel area.
申请公布号 US9594200(B2) 申请公布日期 2017.03.14
申请号 US201514667588 申请日期 2015.03.24
申请人 Samsung Display Co., Ltd. 发明人 Park Seung Won;Kim Tae Woo;Yoon Dae Ho;Lee Moon Gyu
分类号 G02B5/30;G03F7/00 主分类号 G02B5/30
代理机构 Lewis Roca Rothgerber Christie LLP 代理人 Lewis Roca Rothgerber Christie LLP
主权项 1. A method of fabricating a polarizer, the method comprising: forming a base substrate by sequentially forming a metal layer, a guide layer, a hard mask layer, a sacrificial layer, and a first photoresist layer on a light-transmitting substrate in a panel area and an alignment key area spatially separated from the panel area; forming a first photoresist layer pattern for forming an alignment key pattern in the alignment key area by patterning the first photoresist layer; forming a sacrificial layer pattern in the alignment key area utilizing the first photoresist layer pattern as a first mask; and forming a second photoresist layer on a top surface of the sacrificial layer pattern of the alignment key area before removing the sacrificial layer of an aperture area of the panel area.
地址 Yongin-si KR