| 发明名称 | Polishing agent, polishing method, and liquid additive for polishing | ||
| 摘要 | The present invention relates to a polishing agent including: cerium oxide particles; a water-soluble organic polymer having at least one selected from a carboxylic acid group and a salt of carboxylic acid; a water-soluble polyamide having at least one selected from a tertiary amino group and an oxyalkylene chain in a molecule thereof; and water, in which the polishing agent has a pH of 7 or less. | ||
| 申请公布号 | US9593261(B2) | 申请公布日期 | 2017.03.14 |
| 申请号 | US201615014296 | 申请日期 | 2016.02.03 |
| 申请人 | ASAHI GLASS COMPANY, LIMITED | 发明人 | Yoshida Yuiko |
| 分类号 | C09G1/02;H01L21/3105;H01L21/306;C09K13/00;C09K3/14 | 主分类号 | C09G1/02 |
| 代理机构 | Oblon, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A polishing agent comprising: cerium oxide particles; a water-soluble organic polymer having at least one selected from a carboxylic acid group and a salt of carboxylic acid; a water-soluble polyamide having at least one selected from a tertiary amino group and an oxyalkylene chain in a molecule thereof; and water, wherein the polishing agent has a pH of 7 or less. | ||
| 地址 | Chiyoda-ku JP | ||