发明名称 System and method of dynamic and adaptive creation of a wavelength continuous and prescribed wavelength versus time sweep from a laser
摘要 A system (10, 20) and method including a wavelength tuning mechanism and a laser path length tuning mechanism for reducing discontinuities in a sweep range. A processor (14) is coupled to a wavelength monitoring device (18) and the tuning mechanisms. The processor analyzes data from the wavelength monitor to adjust the wavelength tuning and cavity length tuning at discontinuities in the wavelength sweep to reduce the discontinuities.
申请公布号 US9595804(B2) 申请公布日期 2017.03.14
申请号 US201214238282 申请日期 2012.07.21
申请人 Insight Photonic Solutions, Inc. 发明人 Minneman Michael;Ensher Jason;Derickson Dennis;Crawford Michael
分类号 H01S3/10;H01S5/0625;H01S5/065;H01S5/062;H01S5/06;H01S5/14 主分类号 H01S3/10
代理机构 Renner, Otto, Boisselle & Sklar, LLP 代理人 Renner, Otto, Boisselle & Sklar, LLP
主权项 1. A sweeping laser system comprising: a semiconductor laser source that is operable to discretely output radiation over a range of wavelengths in a radiation sweep along a number of wavelength points based on an input signal comprising a group of controlled parameters, wherein a timescale of a period of the radiation sweep is nanoseconds or microseconds and variations in uncontrolled parameters occurring during the sweep have a direct effect on the semiconductor laser source and the electromagnetic radiation output by the semiconductor laser source; a laser control unit operatively coupled to the semiconductor laser source, wherein the semiconductor laser source is configured to receive the input signal from the laser control unit to discretely change the radiation over the range of wavelengths based on the input signal; and a sweep performance monitoring device configured to detect data associated with at least one physical property associated with radiation over the range of wavelengths; and a processor to configure the laser control unit to adjust the input signal to the semiconductor laser source at one or more points in the radiation sweep in order to: achieve adherence to a set of prescribed sweep performance characteristics; andcompensate for the effect of the uncontrolled parameters on the semiconductor laser source and the outputted electromagnetic radiation; wherein each point in the one or more points is adjusted utilizing a plurality of points from any portion in the radiation sweep and the sweep performance monitoring device is coupled to the processor.
地址 Lafayette CO US