发明名称 Method for producing a micromechanical component, and corresponding micromechanical component
摘要 A method for producing a micromechanical component includes providing a substrate with a monocrystalline starting layer which is exposed in structured regions. The structured regions have an upper face and lateral flanks, wherein a catalyst layer, which is suitable for promoting a silicon epitaxial growth of the exposed upper face of the structured monocrystalline starting layer, is provided on the upper face, and no catalyst layers are provided on the flanks. The method also includes carrying out a selective epitaxial growth process on the upper face of the monocrystalline starting layer using the catalyst layer in a reactive gas atmosphere in order to form a micromechanical functional layer.
申请公布号 US9593012(B2) 申请公布日期 2017.03.14
申请号 US201414774799 申请日期 2014.03.12
申请人 Robert Bosch GmbH 发明人 Heuck Friedjof;Schelling Christoph
分类号 B81C1/00 主分类号 B81C1/00
代理机构 Maginot, Moore & Beck LLP 代理人 Maginot, Moore & Beck LLP
主权项 1. A production method for a micromechanical component, comprising: forming a catalyst layer on an upper side of a silicon on insulator substrate, the catalyst layer suitable for promoting silicon growth of the upper side, the substrate including a first silicon layer, an oxide layer, and a starting layer that has exposed structure regions, the structure regions defined by the upper side and lateral flanks, with no catalyst layer formed on the lateral flanks; performing a selective growth process on the upper side of the exposed structure regions of the starting layer via the catalyst layer in a reactive gas atmosphere to form a micromechanical functional layer; and removing at least a portion of the oxide layer of the substrate via sacrificial layer etching such that at least a portion of the micromechanical functional layer is movable relative to the substrate.
地址 Stuttgart DE