发明名称 |
Apparatus of detecting transmittance of trench on infrared-transmittable material and method thereof |
摘要 |
An apparatus is provided for detecting transmittance of a trench. The trench is located on an infrared-transmittable material, which can be a wafer. The wafer is obtained after a ditching process. An image of the wafer is fetched. The contrast of the image is greatly enhanced. The contrast-enhanced image is used for automated analysis of the transmittance of the trench. Accuracy of detecting the transmittance is improved. Hence, the present invention uses a simple structure to detect transmittance defects of the trench for ensuring goodness of the wafer. |
申请公布号 |
US9594021(B2) |
申请公布日期 |
2017.03.14 |
申请号 |
US201514824187 |
申请日期 |
2015.08.12 |
申请人 |
NATIONAL APPLIED RESEARCH LABORATORIES |
发明人 |
Lin Chun-Fu;Chang Chun-Li;Liao Tai-Shan;Huang Hung-Ji;Huang Chi-Hung |
分类号 |
G01N21/00;G01N21/86;G01N21/88;G01N21/59 |
主分类号 |
G01N21/00 |
代理机构 |
Jackson IPG PLLC |
代理人 |
Jackson IPG PLLC ;Jackson Demian K. |
主权项 |
1. An apparatus of detecting transmittance of a trench on an infrared-transmittable material, comprising
a light source emitting a visible light and an infrared light projected onto an infrared-transmittable material having a trench cut therein such that first wavelengths of the infrared light are transmitted in non-cut-through portions of the trench and second wavelengths above and below the first wavelengths are reflected by the trench; an adjustable fixing support having an end located on a base and another end connected to said light source, said fixing support controlling an incidence angle of said light source shining on said infrared-transmittable material; a light intensity sensor located at a corresponding direction of the same side to said light source and being located at a right angle to said infrared-transmittable material, said light intensity sensor collecting bands of a light reflected by said infrared-transmittable material to obtain information of intensity of said light reflected; and a trench-transmittance analysis unit connected with said light intensity sensor, preprocessing an image of said light reflected from the infrared-transmittable material, detecting crack defects and transmittance of said trench after defining a street area bounding the trench, receiving said information of intensity of said light reflected to obtain information of said transmittance of said trench, and classifying said infrared-transmittable material by said crack defects and said transmittance of said trench detected. |
地址 |
Taipei TW |