ELECTRON MICROSCOPY SPECIMEN AND METHOD OF FABRICATION

摘要

A method for preparing plan-view transmission electron microscopy specimens is disclosed. The method employs isotropic vapor-phase etching in conjunction with one or more integrated etch-stop layers that give rise to a support membrane having a well-controlled, substantially uniform thickness. In some embodiments, the support membrane comprises an etch-stop layer that is formed using a high-precision formation process, such as atomic-layer deposition, oxidation, and the like. As a result, formation of the support membrane does not require additional processes, such as mechanical polishing or ion milling, to achieve its desired thickness. The method enables reduced specimen-preparation time, as well as simultaneous preparation of multiple specimens having large, uniformly thick areas for imaging.

主权项

1. A method for forming one or more electron microscopy specimens on a substrate, the method comprising:
providing the substrate comprising a first material, the first material having a first etch rate in a first etchant; forming a first layer on a first surface of the substrate, wherein the first layer is formed via an atomic-layer-deposition process, and wherein the first layer comprises a second material having a second etch rate in the first etchant, and further wherein the second etch rate is slower than the first etch rate; disposing a first specimen on the substrate in a first region such that the first layer is between the substrate and the specimen; and forming a first support membrane in the first region by exposing the first material in the first region to the first etchant, the first support membrane comprising a first portion of the first layer.