SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

A substrate processing apparatus includes a chamber body having an upper opening, a chamber lid part having a lower opening, and a shield plate arranged in a lid internal space of the chamber lid part. The radial dimension of the shield plate is greater than that of the lower opening. Covering the upper opening of the chamber body with the chamber lid part forms a chamber that internally houses a substrate. In the substrate processing apparatus, before the substrate is conveyed and the chamber is formed, the lid internal space of the chamber lid part is filled with the gas supplied from a gas supply part, in a state in which the shield plate overlaps with the lower opening. This allows the chamber to be quickly filled with the gas to achieve a desired low oxygen atmosphere after the formation of the chamber.

主权项

1. A substrate processing apparatus for processing a substrate, comprising:
a substrate holder for holding a substrate in a horizontal position; a chamber lid part having a lower opening and forming a lid internal space above said lower opening; a chamber body having an upper opening and forming a chamber-body internal space, said upper opening opposing said lower opening in an up-down direction; a chamber opening-and-closing mechanism for moving said chamber lid part relative to said chamber body in said up-down direction, and by covering said upper opening with said chamber lid part, forming a chamber that internally houses said substrate holder; a processing-liquid supply part for supplying a processing liquid to an upper surface of said substrate; a shield plate that is arranged in said lid internal space to oppose said upper surface of said substrate and is capable of blocking said lower opening; a shield-plate movement mechanism for moving said shield plate relative to said chamber lid part in said up-down direction within said lid internal space; and a gas supply part for supplying gas to said lid internal space in a state in which said shield plate overlaps with said lower opening of said chamber lid part.