| 发明名称 |
FOCUSED ION BEAM APPARATUS |
| 摘要 |
A focused ion beam apparatus includes an ion source that emits an ion beam, an extraction electrode that extracts ions from a tip end of an emitter of the ion source, and a first lens electrode that configures a condenser lens by a potential difference with the extraction electrode, the condenser lens focusing the ions extracted by the extraction electrode, in which a strong lens action is generated between the extraction electrode and the first lens electrode so as to focus all ions extracted from the ion source to pass through a hole of the condenser lens including the first lens electrode. |
| 申请公布号 |
US2017069456(A1) |
申请公布日期 |
2017.03.09 |
| 申请号 |
US201615256967 |
申请日期 |
2016.09.06 |
| 申请人 |
HITACHI HIGH-TECH SCIENCE CORPORATION |
发明人 |
SUGIYAMA Yasuhiko;OBA Hiroshi |
| 分类号 |
H01J37/08;H01J37/10 |
主分类号 |
H01J37/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A focused ion beam apparatus comprising:
an ion source that emits an ion beam; an extraction electrode that extracts ions from a tip end of an emitter of the ion source; and a first lens electrode that configures a condenser lens by a potential difference with the extraction electrode, the condenser lens being configured to focus the ions extracted by the extraction electrode, wherein a strong lens action is generated between the extraction electrode and the first lens electrode so as to focus all ions extracted from the ion source to pass through the condenser lens including the first lens electrode. |
| 地址 |
Tokyo JP |
