发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 According to one embodiment, the stacked body includes a plurality of electrode films stacked with an insulating body. The insulating body includes a first insulating film provided between the electrode films in a region surrounding the columnar portions. A gap is provided between the electrode films in a region on a lateral side in the first direction of the interconnect portion.
申请公布号 US2017069652(A1) 申请公布日期 2017.03.09
申请号 US201615008554 申请日期 2016.01.28
申请人 Kabushiki Kaisha Toshiba 发明人 ARAI Shinya
分类号 H01L27/115 主分类号 H01L27/115
代理机构 代理人
主权项 1. A semiconductor device, comprising: a substrate; a stacked body provided on the substrate, the stacked body including a plurality of electrode films stacked with an insulating body interposed between the electrode films; a plurality of interconnect portions extending in a stacking direction of the stacked body, dividing the stacked body in a first direction crossing the stacking direction, and separated from each other in the first direction; and a plurality of columnar portions including a semiconductor film extending in the stacking direction in the stacked body, and a charge storage film provided between the semiconductor film and the electrode film, the plurality of columnar portions disposed between the plurality of interconnect portions, the insulating body including a first insulating film provided between the electrode films in a region surrounding the columnar portions, and a gap provided between the electrode films in a region on a lateral side in the first direction of the interconnect portion.
地址 Minato-ku JP