发明名称 |
THERMAL CHEMICAL VAPOR DEPOSITION COATING |
摘要 |
Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article. |
申请公布号 |
WO2017040623(A1) |
申请公布日期 |
2017.03.09 |
申请号 |
WO2016US49647 |
申请日期 |
2016.08.31 |
申请人 |
SILCOTEK CORP. |
发明人 |
VEZZA, Thomas F.;MATTZELA, James B.;BARONE, Gary A.;GROVE, William David;SILVIS, Paul H. |
分类号 |
C23C16/24;C23C16/455 |
主分类号 |
C23C16/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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