SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOGRAPHY

摘要

A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition includes a polymerizable component. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition-and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.

主权项

1. A nanoimprint lithography method comprising:
disposing a pretreatment composition on a substrate to form a pretreatment coating on the substrate, wherein the pretreatment composition comprises a polymerizable component; disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the substrate, wherein the imprint resist is a polymerizable composition; forming a composite polymerizable coating on the substrate as each discrete portion of the imprint resist spreads beyond its target area, wherein the composite polymerizable coating comprises a mixture of the pretreatment composition and the imprint resist; contacting the composite polymerizable coating with a nanoimprint lithography template; and polymerizing the composite polymerizable coating to yield a composite polymeric layer on the substrate, wherein:
the interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air,the difference between the interfacial surface energy between the pretreatment composition and air and between the imprint resist and air is in a range of 0.5 mN/m to 25 mN/m,the interfacial surface energy between the imprint resist and air is in a range of 20 mN/m to 60 mN/m, andthe interfacial surface energy between the pretreatment composition and air is in a range of 30 mN/m to 45 mN/m.