| 摘要 |
An apparatus for spraying a photo-resist comprises a resist supply reservoir, a pump and a supply line from the pump to a nozzle. Further provided is a standby receptacle into which an end portion of the nozzle is inserted when not being utilized in a spraying operation. The standby receptacle is supplied with N2 gas, bubbled through a solvent which is held at a bottom portion of the container, surrounded by an air space. The nozzle rests in a nozzle holder so as to be exposed to the internal atmosphere of the container for preventing clogging of the nozzle due to drying of the solvent when the nozzle is not in use.
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