| 摘要 |
Provided is an active energy ray curable composition for photoresists, which has excellent heating stability and exhibits good curability when cured. An active energy ray curable composition for photoresists, which contains an acrylic copolymer resin (A), an acrylic copolymer resin (B) and a photopolymerization initiator (C), and wherein: the acrylic copolymer resin (A) has a (meth)acryloyl group and a carboxyl group in side chains; and the acrylic copolymer resin (B) has a (meth)acryloyl group and a carboxyl group in side chains, while having a resin skeleton which is different from that of the acrylic copolymer resin (A). |
