INTERFERENCE LITHOGRAPHY DEVICE

摘要

An interference lithography device is provided with a laser source for providing a laser beam; a base thereon having a beam splitter for dividing the laser beam into a first beam portion and a second beam portion, a beam expander, a first set of reflectors, and a second set of reflectors; a set of lower reflectors; and a sample carrying stage for holding a substrate. The first beam portion and the second beam portion are respectively reflected from the second set of reflectors and then respectively reflected by the set of lower reflectors to form an interference pattern on the substrate.

主权项

1. An interference lithography device, comprising:
a laser source providing a laser beam; a base having:
a beam splitter disposed on the base and configured to divide the laser beam into a first beam portion and a second beam portion;a beam expander disposed on the base and in front of the beam splitter to respectively expand a diameter of the first beam portion and a diameter of the second beam portion;a first set of reflectors disposed on the base and between the beam splitter and the beam expander, and having a first reflector and a second reflector respectively reflecting the first beam portion and the second beam portion to enter the beam expander; anda second set of reflectors disposed on the base and in front of the beam expander, and having a third reflector and a fourth reflector respectively reflecting the first beam portion and the second beam portion; a set of lower reflectors disposed below the base, and including a fifth reflector, a sixth reflector and a first lateral rail, wherein the fifth reflector and the sixth reflector are laterally movably mounted on the first lateral rail respectively; and a sample carrying stage disposed below the base and in front of the set of lower reflectors for loading a substrate, wherein the sample carrying stage is laterally movably mounted on a second lateral rail which is longitudinally movably mounted on a longitudinal rail; wherein the first beam portion and the second beam portion are respectively reflected by the third reflector and the fourth reflector toward the set of lower reflectors, and then are respectively reflected by the fifth reflector and the sixth reflector so that the first beam portion and the second beam portion commonly form an interference pattern on the substrate.