POLARIZATION CONTROL OF PULSED LIGHT BEAM

摘要

A photolithography system includes an optical system, an actuation apparatus, and a control module. The optical system includes an optical source that produces a pulsed light beam traveling along a beam path; a plurality of optical components positioned between the optical source and a photolithography exposure apparatus, at least some of the plurality of optical components configured to receive the pulsed light beam and direct the pulsed light beam to the photolithography exposure apparatus; and an optical element positioned to interact with the pulsed light beam. The actuation apparatus is coupled to the optical element. The actuation apparatus is configured to adjust a physical property of the optical element based on a control signal from the control module to thereby adjust a polarization of the pulsed light beam.

主权项

1. A photolithography system comprising:
an optical system comprising:
an optical source that produces a pulsed light beam traveling along a beam path;a plurality of optical components positioned between the optical source and a photolithography exposure apparatus, at least some of the plurality of optical components configured to receive the pulsed light beam and direct the pulsed light beam to the photolithography exposure apparatus; andan optical element positioned to interact with the pulsed light beam; an actuation apparatus coupled to the optical element, the actuation apparatus comprising a rotation mechanism to which the optical element is fixed, wherein the rotation mechanism is configured to adjust an angle of the optical element relative to an optical axis of the pulsed light beam based on a control signal to thereby adjust a polarization of the pulsed light beam; and a control module connected to the photolithography exposure apparatus, the optical system, and the actuation apparatus, the control module configured to:
receive one or more parameters from one or more of the photolithography exposure apparatus and the optical system,analyze the one or more parameters to determine whether any of the parameters is outside an acceptable range of target values; andif the determination indicates that any of the parameters is outside the acceptable range of target values, send the control signal to the actuation apparatus to adjust the angle of the optical element to thereby alter the polarization of the pulsed light beam; wherein the rotation mechanism either adjusts an angle of the optical element about a perpendicular element axis that is perpendicular to a first direction of polarization of the pulsed light beam or adjusts an angle of the optical element about a parallel element axis that is parallel with the first direction of polarization of the pulsed light beam.