GAS SUPPLY UNIT AND SUBSTRATE PROCESSING SYSTEM

摘要

A substrate processing system may include a process chamber in which a process on a substrate is performed, a supporting unit in the process chamber to support the substrate, a gas supply unit including a gas supply part with gas supply holes, with the gas supply holes being configured to supply a process gas onto the substrate, and an exhaust unit configured to exhaust the process gas from the process chamber. The gas supply part may include a gas supply region provided with the gas supply holes and a gas diffusion region between the gas supply region and the exhaust unit. The gas diffusion region may be free of the gas supply holes.

主权项

1. A substrate processing system comprising:
a process chamber in which a process on a substrate is performed; a supporting unit in the process chamber and configured to support the substrate; a gas supply unit including a gas supply part with gas supply holes, the gas supply holes being configured to supply a process gas onto the substrate; and an exhaust unit configured to exhaust the process gas from the process chamber, wherein the gas supply part includes a gas supply region provided with the gas supply holes and a gas diffusion region between the gas supply region and the exhaust unit, and the gas diffusion region is free of the gas supply holes.