| 发明名称 |
POLISHING PAD WITH FOUNDATION LAYER AND WINDOW ATTACHED THERETO |
| 摘要 |
Polishing pads having a foundation layer and a window attached to the foundation layer, and methods of fabricating such polishing pads, are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a first modulus. A polishing layer is attached to the foundation layer and has a second modulus less than the first modulus. A first opening is through the polishing layer and a second opening is through the foundation layer. The first opening exposes at least a portion of the second opening and exposes a portion of the foundation layer. A window is disposed in the first opening and is attached to the exposed portion of the foundation layer. |
| 申请公布号 |
US2017120417(A1) |
申请公布日期 |
2017.05.04 |
| 申请号 |
US201514931737 |
申请日期 |
2015.11.03 |
| 申请人 |
Cabot Microelectronics Corporation |
发明人 |
Lefevre Paul Andre;Allison William C.;Scott Diane;Arno Jose |
| 分类号 |
B24B37/22 |
主分类号 |
B24B37/22 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A polishing pad for polishing a substrate, the polishing pad comprising:
a foundation layer having a first modulus; a polishing layer attached to the foundation layer and having a second modulus less than the first modulus; a first opening through the polishing layer and a second opening through the foundation layer, the first opening exposing at least a portion of the second opening and exposing a portion of the foundation layer; and a window disposed in the first opening and attached to the exposed portion of the foundation layer. |
| 地址 |
Aurora IL US |
