发明名称 |
METHOD OF MANUFACTURING LIGHT-EMITTING DISPLAY DEVICE |
摘要 |
Provided is a method of manufacturing a light-emitting display device. The method of manufacturing a light-emitting display device may comprise: forming a first electrode on a substrate, the substrate having a plurality of first pixel areas and a plurality of second pixel areas, the first electrode being formed in each of the first and second pixel areas such that corresponding first and second pixels are formed; forming a pixel defining layer on the substrate, the pixel defining layer having an opening exposing the first electrode of each of the first and second pixels; forming a first photoresist pattern on the pixel defining layer, the first photoresist pattern having a first pattern opening exposing the first electrode of each of the first pixels; forming a light-emitting layer on the first electrode exposed through the first pattern opening; and removing the first photoresist pattern. |
申请公布号 |
US2017125745(A1) |
申请公布日期 |
2017.05.04 |
申请号 |
US201615138341 |
申请日期 |
2016.04.26 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
LEE Duck Jung;KWON Young Gil;KIM Mu Gyeom;CHOUNG Ji Young |
分类号 |
H01L51/56;H01L51/00;H01L27/32 |
主分类号 |
H01L51/56 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a light-emitting display device, the method comprising:
forming a first electrode on a substrate, the substrate having a plurality of first pixel areas and a plurality of second pixel areas, the first electrode being formed in each of the first and second pixel areas such that corresponding first and second pixels are formed; forming a pixel defining layer on the substrate, the pixel defining layer having an opening exposing the first electrode of each of the first and second pixels; forming a first photoresist pattern on the pixel defining layer, the first photoresist pattern having a first pattern opening exposing the first electrode of each of the first pixels; forming a light-emitting layer on the first electrode exposed through the first pattern opening; and removing the first photoresist pattern. |
地址 |
Yongin-si KR |