发明名称 GERMANIUM TIN CHANNEL TRANSISTORS
摘要 Techniques related to transistors and integrated circuits having germanium tin, systems incorporating such transistors, and methods for forming them are discussed. Such transistors include a channel region that comprises a germanium tin portion of a fin such that the fin includes a buffer layer disposed over a substrate and the germanium tin portion disposed over the buffer layer.
申请公布号 US2017125527(A1) 申请公布日期 2017.05.04
申请号 US201415121745 申请日期 2014.03.27
申请人 Intel Corporation 发明人 Pillarisetty Ravi;Le Van H.;Rachmady Willy;Kotlyar Roza;Radosavljevic Marko;Then Han Wui;Dasgupta Sansaptak;Dewey Gilbert;Chu-Kung Benjamin;Kavalieros Jack T.
分类号 H01L29/161;H01L29/165;H01L27/092;H01L21/8238;H01L27/11;H01L29/66;H01L21/8234;H01L29/78;H01L27/088 主分类号 H01L29/161
代理机构 代理人
主权项
地址 Santa Clara CA US