发明名称 PHOTOSENSITIVE RESIN COMPOSITION, WAVELENGTH CONVERSION SUBSTRATE AND LIGHT EMITTING DEVICE
摘要 A photosensitive resin composition includes a positive photosensitive resin having a photosensitive moiety that cleaves upon exposure to light, and a wavelength conversion material dispersed in the photosensitive resin. The photosensitive resin and the wavelength conversion material meet (i) to (iv): (i) The photosensitive moiety and the cleavage product of the photosensitive resin do not neutralize the wavelength conversion material;(ii) The photosensitive moiety and the cleavage product do not induce hydrolysis of the wavelength conversion material;(iii) The HOMOs of the photosensitive moiety and the cleavage product are lower than the LUMO of the wavelength conversion material; and(iv) The LUMOs of the photosensitive moiety and the cleavage product are higher than the HOMO of the wavelength conversion material.(Any combination of a chemically amplified photosensitive resin with an acidic photosensitive moiety or cleavage product and an acidic wavelength conversion material is excluded.)
申请公布号 US2017123317(A1) 申请公布日期 2017.05.04
申请号 US201515318034 申请日期 2015.06.12
申请人 Sharp Kabushiki Kaisha 发明人 KAMURA Masakazu;IWATA Akiko;NAKANO Hiroshi;ZHANG Bai;MATSUKIYO Hidetsugu;AOMORI Shigeru
分类号 G03F7/039;G02B5/20;F21V9/16 主分类号 G03F7/039
代理机构 代理人
主权项 1. A photosensitive resin composition comprising: a positive photosensitive resin having a photosensitive moiety that cleaves upon exposure to light; and a wavelength conversion material dispersed in the photosensitive resin, wherein the photosensitive resin and the wavelength conversion material meet the following (i) to (iv): (i) the photosensitive moiety and a cleavage product of the photosensitive resin do not neutralize the wavelength conversion material; (ii) the photosensitive moiety and the cleavage product do not induce hydrolysis of the wavelength conversion material; (iii) HOMOs of the photosensitive moiety and the cleavage product are lower than a LUMO of the wavelength conversion material; and (iv) LUMOs of the photosensitive moiety and the cleavage product are higher than a HOMO of the wavelength conversion material (excluding any combination of a chemically amplified photosensitive resin with an acidic photosensitive moiety or cleavage product and an acidic wavelength conversion material).
地址 Sakai City, Osaka JP