发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, WAVELENGTH CONVERSION SUBSTRATE AND LIGHT EMITTING DEVICE |
摘要 |
A photosensitive resin composition includes a positive photosensitive resin having a photosensitive moiety that cleaves upon exposure to light, and a wavelength conversion material dispersed in the photosensitive resin. The photosensitive resin and the wavelength conversion material meet (i) to (iv):
(i) The photosensitive moiety and the cleavage product of the photosensitive resin do not neutralize the wavelength conversion material;(ii) The photosensitive moiety and the cleavage product do not induce hydrolysis of the wavelength conversion material;(iii) The HOMOs of the photosensitive moiety and the cleavage product are lower than the LUMO of the wavelength conversion material; and(iv) The LUMOs of the photosensitive moiety and the cleavage product are higher than the HOMO of the wavelength conversion material.(Any combination of a chemically amplified photosensitive resin with an acidic photosensitive moiety or cleavage product and an acidic wavelength conversion material is excluded.) |
申请公布号 |
US2017123317(A1) |
申请公布日期 |
2017.05.04 |
申请号 |
US201515318034 |
申请日期 |
2015.06.12 |
申请人 |
Sharp Kabushiki Kaisha |
发明人 |
KAMURA Masakazu;IWATA Akiko;NAKANO Hiroshi;ZHANG Bai;MATSUKIYO Hidetsugu;AOMORI Shigeru |
分类号 |
G03F7/039;G02B5/20;F21V9/16 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
1. A photosensitive resin composition comprising:
a positive photosensitive resin having a photosensitive moiety that cleaves upon exposure to light; and a wavelength conversion material dispersed in the photosensitive resin, wherein the photosensitive resin and the wavelength conversion material meet the following (i) to (iv): (i) the photosensitive moiety and a cleavage product of the photosensitive resin do not neutralize the wavelength conversion material; (ii) the photosensitive moiety and the cleavage product do not induce hydrolysis of the wavelength conversion material; (iii) HOMOs of the photosensitive moiety and the cleavage product are lower than a LUMO of the wavelength conversion material; and (iv) LUMOs of the photosensitive moiety and the cleavage product are higher than a HOMO of the wavelength conversion material (excluding any combination of a chemically amplified photosensitive resin with an acidic photosensitive moiety or cleavage product and an acidic wavelength conversion material). |
地址 |
Sakai City, Osaka JP |