发明名称 |
MASK BLANK, PHASE SHIFT MASK, AND PRODUCTION METHOD THEREOF |
摘要 |
The present invention provides a mask blank including: a transparent substrate, a half-transparent layer for controlling a phase and a transmittance of the exposure light, formed on the transparent substrate, a middle layer formed on the half-transparent layer, and a light-shielding layer formed on the middle layer, wherein the light-shielding layer is constituted with a single metal material not including a transition metal; a film thickness of the light-shielding layer is 40 nm or less; and an optical density of a laminated body, in which three kinds of layers: the half-transparent layer, the middle layer, and the light-shielding layer are laminated, with respect to the exposure light is a value to the extent that the laminated body functions as a light-shielding region or more; the mask blank is used for producing a half tone type phase shift mask, and suitable for a lithography technique on a wafer from 40 nm half pitch and on for its high light-shielding property even thinning the light-shielding pattern film, capability of decreasing the value of EMF bias, and excellency in pattern processability, light-shielding property and chemical resistance. |
申请公布号 |
US2017123305(A1) |
申请公布日期 |
2017.05.04 |
申请号 |
US201515301900 |
申请日期 |
2015.01.29 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
WATANABE Hiroshi;HAYANO Katsuya;TAKAMIZAWA Hideyoshi;OHKAWA Youhei;ADACHI Takashi;TANI Ayako;MIURA Yoichi |
分类号 |
G03F1/32 |
主分类号 |
G03F1/32 |
代理机构 |
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代理人 |
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主权项 |
1. A mask blank to be used for producing a half tone type phase shift mask which applies an ArF excimer laser exposure light, comprising:
a transparent substrate, a half-transparent layer for controlling a phase and a transmittance of the exposure light, formed on the transparent substrate, a middle layer formed on the half-transparent layer, and a light-shielding layer formed on the middle layer, wherein the light-shielding layer is comprised of a single metal material not including a transition metal, a film thickness of the light-shielding layer is 40 nm or less, and an optical density of a laminated body, in which three kinds of layers: the half-transparent layer, the middle layer, and the light-shielding layer are laminated, with respect to the exposure light is a value to the extent that the laminated body functions as a light-shielding region or more. |
地址 |
Tokyo-to JP |