DATA PROCESSING APPARATUS

摘要

Provided are a data processing apparatus and a substrate inspection method. The data processing apparatus includes a first sensing unit which generates first data about a target, a second sensing unit which generates second data about the target, a splitter unit which receives and synchronizes the first data and the second data and outputs m pieces of copied data by copying the synchronized data, and a processing unit which receives and processes any one of the m pieces of copied data, wherein the second data has a time difference with the first data, and m is a natural number of two or more.

主权项

1. A data processing apparatus comprising:
a first sensor configured to generate first data about a target; a second sensor configured to generate second data about the target, the second data having a time difference from the first data; a splitter configured to receive and synchronize the first data and the second data, and output m pieces of copied data by copying the synchronized data; and a processor configured to receive and process any one of the m pieces of copied data, and m is a natural number of 2 or more.