发明名称 Package substrate, semiconductor package and method of manufacturing the same
摘要 A package substrate and a semiconductor package are provided. The package substrate includes an insulating layer having opposing first and second surfaces; a first wiring layer formed in the insulating layer, exposed from the first surface of the insulating layer, and having a plurality of first conductive pads; a second wiring layer formed in the insulating layer, exposed from the second surface, and having a plurality of second conductive pads; a third wiring layer formed on the first surface and electrically connected with the first wiring layer; a plurality of first metal bumps formed on the first conductive pads corresponding; and at least one conductive via vertically embedded in the insulating layer and electrically connected to the second and third wiring layers. Therefore, the surfaces of first conductive pads are reduced, and the non-wetting between the first conductive pads and the solder materials formed on conductive bumps is avoided.
申请公布号 US9640503(B2) 申请公布日期 2017.05.02
申请号 US201514837245 申请日期 2015.08.27
申请人 Siliconware Precision Industries Co., Ltd. 发明人 Sun Ming-Chen;Lin Chun-Hsien;Shen Tzu-Chieh;Chiu Shih-Chao;Pai Yu-Cheng
分类号 H01L23/00;H01L21/56;H01L23/31;H05K1/11;H05K3/00;H05K3/40;H05K3/20;H05K3/42 主分类号 H01L23/00
代理机构 Mintz Levin Cohn Ferris Glovsky and Popeo, P.C. 代理人 Mintz Levin Cohn Ferris Glovsky and Popeo, P.C. ;Corless Peter F.;Jensen Steven M.
主权项 1. A package substrate, comprising: an insulating layer having opposing first and second surfaces; a first wiring layer embedded in the insulating layer, exposed from the first surface, and having a plurality of first conductive pads; a second wiring layer embedded in the insulating layer, exposed from the second surface, and having a plurality of second conductive pads; a third wiring layer formed on the first surface and electrically connected with the first wiring layer; a plurality of first metal bumps formed on the first conductive pads correspondingly; and at least one conductive via embedded in the insulating layer and electrically connected with the second wiring layer and the third wiring layer.
地址 Taichung TW